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    Page locationPage location : Home > Product Center > Aluminum hydroxide > Aluminum hydroxide for photoelectric glass

    Aluminum hydroxide for photoelectric glass

    Release time:2020-07-14

        Aluminum hydroxide for photoelectric glass

        Performance characteristics: high purity, reasonable particle size distribution, good reaction activity, good fluidity, easy mixing and good photoelectric performance, which can enhance the chemical stability of glass substrate, improve the strain point and elastic modulus of glass, reduce the glass expansion coefficient, improve the electrical properties, strength and wear resistance, and make the glass have stable performance and good insulation performance.
        Application: widely used in TFT-LCD substrate glass, PDP substrate glass, high strength wear-resistant glass, photovoltaic solar glass, cover glass and other industries.

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    Address:1105 science Avenue
    Email:zztmwfgs158@sina.com
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